Interfaces, Mutimatériaux, Sources et Optique X

Publications

The thermal stability of Al(1%wtSi)/Zr EUV mirrors

Q. Zhong, Z. Zhang, J.-T. Zhu, Z.-S. Wang, H. Chen, P. Jonnard, K. Le Guen, Y.-Y. Yuan, J.-M. André, H.-J. Zhou, T.-L. Hu

Appl. Phys. A109, 133-138 (2012)(http://dx.doi.org/10.1007/s00339-012-7085-1)

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Influence of working gas pressure on the performance of W/Si multilayers

F.-F. Wang, J.-T. Zhu, Q. Zhong, Z.-S. Wang, P. Jonnard, K. Le Guen, J.-M. André, M. Fialin

Chin. Phys. C36, 909-914 (2012) (http://dx.doi.org/10.1088/1674-1137/36/9/021) (http://dx.doi.org/10.1088/1674-1137/36/9/021)

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An etched multilayer as a dispersive element in a curved-crystal spectrometer: implementation and performance

P. Jonnard, K. Le Guen, J.-M. André, J.-R. Coudevylle, N. Isac

X-Ray Spectrom. 41, 308-312 (2012) (http://dx.doi.org/10.1002/xrs.2398)

http://hal.archives-ouvertes.fr/hal-00725539

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Optical and structure performance of the Al/Zr reflection multilayers in the 17–19nm region

Q. Zhong, W.-B Li, Z. Zhang, J.T. Zhu, Q.-S. Huang, H.C. Li, Z.-S. Wang, P. Jonnard, K. Le Guen, J.-M. André, H.-J. Zhou, T.-L. Huo

Opt. Express 20, 10692-10700 (2012) (http://dx.doi.org/10.1364/OE.20.010692)

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Investigation of the thermal stability of Mg/Co periodic multilayers for EUV applications

M.-H. Hu, K. Le Guen, J.-M. André, S. K. Zhou, H. Ch. Li, J. T. Zhu, Z. S. Wang, C. Meny, N. Mahne, A. Giglia, S. Nannarone, I. Estève, M. Walls, P. Jonnard

Appl. Phys. A106, 737-745 (2012) (http://dx.doi.org/10.1007/s00339-011-6681-9)

http://hal.archives-ouvertes.fr/hal-00648899/fr/ http://arxiv.org/abs/1112.1292

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Introduction of Zr layers in Mg/Co multilayers

K. Le Guen, M.-H. Hu, J.-M. André, P. Jonnard, S. K. Zhou, H. C. Li, J. T. Zhu, Z. S. Wang, N. Mahne, A. Giglia, S. Nannarone

Appl. Phys. A102, 69-77 (2011) (http://dx.doi.org/10.1007/s00339-010-6093-2)

http://hal.archives-ouvertes.fr/hal-00642789/fr/

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Cauchois & Sénémaud Tables of wavelengths of x-ray emission lines and absorption edges

P. Jonnard, C. Bonnelle

X-Ray Spectrom. 40, 12-16 (2011) (http://dx.doi.org/10.1002/xrs.1293)

http://hal.archives-ouvertes.fr/hal-00596480/fr/

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Characterization of EUV periodic multilayers

K. Le Guen, M.-H Hu, J.-M. André, P. Jonnard, Z. Wang, J. Zhu, A. Galtayries, C. Meny, E. Meltchakov, C. Hecquet, F. Delmotte

X-Ray Spectrom. 40, 338-342 (2011) (http://dx.doi.org/10.1002/xrs.1350)

http://hal.archives-ouvertes.fr/hal-00642782/fr/

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Origin of step-like behavior in Co/Si system

A. Sagdeo, S. Rai, A. K. Srivastava,G. S. Lodha, R. Rawat, K. Le Guen, P. Jonnard

J. Phys. Cond. Matter 23, 246004 (2011) (8 pages)

(http://dx.doi.org/10.1088/0953-8984/23/24/246004)

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Observation of an asymmetrical effect when introducing Zr in Mg/Co multilayers

K. Le Guen, M.-H. Hu, J.-M. André, S. K. Zhou, H. Ch. Li, J. T. Zhu, Z. S. Wang, C. Meny, A. Galtayries, P. Jonnard

Appl. Phys. Lett. 98, 251909 (2011) (3 pages) (http://dx.doi.org/10.1063/1.3601859)

http://hal.archives-ouvertes.fr/hal-00642773/fr/

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Molybdenum-silicon aperiodic multilayer broadband polarizer for 13-30 nm wavelength range

M. Y. Tan, J. T. Zhu, Z. S. Wang, K. Le Guen, P. Jonnard, A. Giglia, N. Mahne, S. Nannarone

NIM A654, 588-591 (2011) (http://dx.doi.org/10.1016/j.nima.2011.07.007)

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Effective mass of photons in one dimensional photonic crystal

J.-M. André, P. Jonnard

Phys. Scr. 84, 035708 (2011) (5 pages)

(http://dx.doi.org/doi:10.1088/0031-8949/84/03/035708)

http://hal.archives-ouvertes.fr/hal-00631235/fr/

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DUVEX: an x-ray counting system based on YAG:Ce scintillator

J-M. André, K. Le Guen, P. Jonnard, Y. Ménesguen

NIM A659, 318 (2011) (http://dx.doi.org/10.1016/j.nima.2011.08.010)

http://hal.archives-ouvertes.fr/hal-00637832/fr/

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Investigation of the thermal stability of Mg/Co periodic multilayers for EUV applications

M.-H. Hu, K. Le Guen, J.-M. André, S. K. Zhou, H. Ch. Li, J. T. Zhu, Z. S. Wang, C. Meny, N. Mahne, A. Giglia, S. Nannarone, I. Estève, M. Walls, P. Jonnard

Appl. Phys. A sous presse (http://dx.doi.org/10.1007/s00339-011-6681-9)

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Thermal stability of Mg/Co multilayer with B₄C, Mo or Zr diffusion barrier layers

J. T. Zhu, S. K. Zhou, H. Ch. Li, Z. S. Wang, P. Jonnard, K. Le Guen, M.-H. Hu, J.-M. André, H. J. Zhou, T.L. Huo

Opt. Express 19, 21849-21854 (2011) (http://dx.doi.org/10.1364/OE.19.021849)